Tuam Tshoj ntsib qhov sib txawv ntawm cov thev naus laus zis tseem ceeb hauv cov roj tshwj xeeb rau Kev Sib Koom Tes Loj Loj (VLSI) thiab Ultra Loj Scale Integration (ULSI) daim ntawv thov, nrog cov pa roj ntau tshaj 6N purity (99.9999%) tag nrho nyob ntawm kev xa khoom.
Txhawm rau hais txog qhov kev thov nce ntxiv rau cov roj hluav taws xob tshwj xeeb thoob plaws cov khoom siv hluav taws xob semiconductor, kev tsim hluav taws xob, thiab kev lag luam photovoltaic, peb lub tuam txhab tau tsim muaj kev lag luam tawm tswv yim- koom tes nrog University Zhejiang hauv xyoo tas los no. Qhov kev sib koom tes no tsom mus rau kev txhim kho ntawm 6N- qib roj hluav taws xob hluav taws xob, hla kev siv thev naus laus zis hauv tsev thiab daws qhov teeb meem tseem ceeb no.
Nyob rau lub Rau Hli 2025, peb lub tuam txhab tau tsim lub Zhejiang University Specialty Gas & Equipment Innovation Team, muaj nplooj siab xav muab cov khoom siv semiconductor nrog cov txheej txheem ntau lawm rau cov khoom siv hluav taws xob.
Los ntawm kev sib koom tes kev tshawb fawb thiab kev sib koom ua ke thev naus laus zis, peb tau ua tiav kev tsim khoom thiab kev ua kom huv huv rau cov ntaub ntawv muaj txiaj ntsig ntawm siab -purity cov pa roj tshwj xeeb, suav nrog: Nitrous Oxide (N₂O), Boron Trichloride (BCl₃), Trimethylsilane (3MS), Propylene (C₃OctaH) (C₄F₈), Hexafluoroethane (C₂F₆), Hydrogen Bromide (HBr) thiab lwm yam.
Tsis tas li ntawd, peb tau ua tiav qhov kev ua tiav loj hauv Air Separation Unit (ASU) thev naus laus zis, ua kom pom cov txiaj ntsig zoo ntawm argon rov qab thiab qis - zog ua haujlwm, ua kom muaj txiaj ntsig zoo ntawm tag nrho cov kev ua haujlwm thiab kev lag luam.
Txhawm rau hais txog qhov kev thov nce ntxiv rau cov roj hluav taws xob tshwj xeeb thoob plaws cov khoom siv hluav taws xob semiconductor, kev tsim hluav taws xob, thiab kev lag luam photovoltaic, peb lub tuam txhab tau tsim muaj kev lag luam tawm tswv yim- koom tes nrog University Zhejiang hauv xyoo tas los no. Qhov kev sib koom tes no tsom mus rau kev txhim kho ntawm 6N- qib roj hluav taws xob hluav taws xob, hla kev siv thev naus laus zis hauv tsev thiab daws qhov teeb meem tseem ceeb no.
Nyob rau lub Rau Hli 2025, peb lub tuam txhab tau tsim lub Zhejiang University Specialty Gas & Equipment Innovation Team, muaj nplooj siab xav muab cov khoom siv semiconductor nrog cov txheej txheem ntau lawm rau cov khoom siv hluav taws xob.
Los ntawm kev sib koom tes kev tshawb fawb thiab kev sib koom ua ke thev naus laus zis, peb tau ua tiav kev tsim khoom thiab kev ua kom huv huv rau cov ntaub ntawv muaj txiaj ntsig ntawm siab -purity cov pa roj tshwj xeeb, suav nrog: Nitrous Oxide (N₂O), Boron Trichloride (BCl₃), Trimethylsilane (3MS), Propylene (C₃OctaH) (C₄F₈), Hexafluoroethane (C₂F₆), Hydrogen Bromide (HBr) thiab lwm yam.
Tsis tas li ntawd, peb tau ua tiav qhov kev ua tiav loj hauv Air Separation Unit (ASU) thev naus laus zis, ua kom pom cov txiaj ntsig zoo ntawm argon rov qab thiab qis - zog ua haujlwm, ua kom muaj txiaj ntsig zoo ntawm tag nrho cov kev ua haujlwm thiab kev lag luam.
